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You are here: Home » Products » sputtering target MoS2 99.9% for Ion Beam Sputtering
sputtering target MoS2 99.9% for Ion Beam Sputtering
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Product: Views:125sputtering target MoS2 99.9% for Ion Beam Sputtering 
Unit price: Negotiable
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Delivery date: Since the payment date Days delivery
Valid until: Long-term effective
Last updated: 2017-09-10 04:55
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MoS2 target 99.9% Physical properties Color Black Density 4.80g/ml Melting point 1185 Technical indicators purity 99.9% Relative density >99% Cut surface flatness 3.2Ra Tolerance ±0.1mm grain size uniform Material MoS2 Brand MAT-CN Origin Nanchang Jiangxi Specifications Size 01: diameter <360mm thickness> 1 mm (wafer / round table / rod) Size 02: length <300mm width <300mm thickness> 1mm (rectangular / sheet /splicing) Size 03: outer diameter <360mm inner diameter> 1mm length> 1 mm (pipe / ring / rotatable targets) Size 04: be customized according to user needs, sample processing, to map processing Minimum order quantity 1 piece, large concessions Supply capacity the same batch, the same material, continuous and reliable supply; 100 kg / month min Delivery time 3 weeks after payment,excluding special materials Production process vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining Applicable instruments various models magnetron sputtering equipment, etc. Product accessories formal quotation / purchase and sales contracts / packing list / material analysis detection of single / formal invoice Mode of transport for domestic express carrier (SF, Shen Tong, EMS, Nadu --- safe, fast and reliable)
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